Nanotechnology reaches 30-nm images with nano-imprint lithography
25 February, 2003 - Less than a minute readMotorola Inc. has disclosed new details about its internal nano-imprint lithography program, claiming it has demonstrated the ability to print feature sizes down to 30-nm with a tool from a U.S. startup Molecular Imprints Inc. (MII, Austin, Texas). This demonstrates the feasibility of nano-imprint lithography in future device production.
25.Feb.2003
Semiconductor Business News
0 Comments